产品信息

The Primaxx® Monarch300 is a fully integrated, automated VHF etch tool designed to perform selective MEMS etch release via a controlled anhydrous HF/Alcohol etch process. The process provides a vapor phase, isotropic etch of sacrificial oxide to release a flexure or other device. No liquids are used in contact with these MEMS devices and therefore “stiction” creating conditions are avoided. A clean, residue-free release etch is accomplished without liquids or supercritical drying.

Key Benefits

  ·  Compatible with 200mm & 300mm wafers

  ·  High throughput, high uptime 13-wafer batch processing

  ·  Process chamber, gas/liquid panel, and pressure/vacuum 

     components, all within a small footprint

  ·  Extensive process control and monitoring functions ensure 

     the yield, reliability and repeatability required in volume 

     production

Available configurations:

  ·  300mm fxP supports up to 6 process modules

  ·  Versalis capability enables other SPTS modules to be added 

     to either platform if required

Dry HF vapor etch processing for removing sacrificial oxide layers 

Our proprietary dry process avoids stiction of released moving parts and damage to delicate structures – common issues with conventional wet processing technology.

Combining anhydrous HF vapor and alcohol vapor at reduced pressure and elevated temperature provides a wide, stable process window that can address different oxide compositions and thicknesses, while maintaining high selectivity to other common materials found in MEMS designs including exposed aluminum/alloy features such as mirrors and bondpads.

The Monarch25 is a 25-wafer batch process module designed for medium to high volume HF release etch production applications in either the Primaxx® fxP or Primaxx® c2L configurations.

Key Benefits

  · High throughput, high uptime 25-wafer batch processing

  · Process chamber, gas/liquid panel, and pressure/vacuum 

    components, all within a small footprint

  · Extensive process control and monitoring functions ensure 

    the yield, reliability and repeatability required in volume 

    production

Available configurations:

  · c2L supports up to 3 process modules

  · 200mm fxP supports up to 6 process modules

  · Versalis capability enables other SPTS modules to be added 

    to either platform if required

The Monarch 3 is a compact module includes a 3-wafer process chamber, and is designed for research laboratory and small volume production environments.

Key Benefits

  · An integrated Panel PC, with on-board electronics minimizes cleanroom footprint

  · Third generation process chamber has been designed for easy wafer size changes and 

    maintenance

  · Wafer loading options include a semi-automatic 3-wafer loader with load lock, and various 

    cluster-based configurations

SPTS's uEtch is a single-wafer system specifically designed for university and small research laboratories.

Key Benefits

  · Fully integrated, compact system includes built-in HF gas cabinet

  · PLC controlled with multi-user features and extensive safety interlocks

  · Can process single whole wafers (100-200mm) or die on a carrier

  · HF vapor processes are transferable to SPTS 3- and 25-wafer production systems, offering a path from concept to 

    production