产品信息

The Delta® PECVD systems are used for a wide range of applications within MEMS, compound semiconductors, and advanced packaging

Key Benefits

  · Wafer sizes from 75mm to 300mm

  · Radially symmetrical gas flow for superior wafer-in-wafer (WIW) uniformity

  · Up to 10 gas lines and optional on-board liquid delivery system

  · Mixed frequency plasma capability for stress tuning

  · Active platen cooling for critical, low temperature [<175°C] packaging applications

  · Single and multi-wafer preheat chamber options for de-gassing sensitive substrates