产品信息

Molecular Vapor Deposition (MVD®) Systems

MVD® replaces traditional liquid coating processes with a highly reproducible vapor deposition alternative that is ideal for manufacturing applications.

Typical MEMS devices benefiting from MVD® hydrophobic anti-stiction films include displays, sensors, actuators, RF switches, inkjets, and data storage devices. BioMEMS applications include wetting control in micro-fluidics (lab-on-a-chip, microplates), passivation on implantable devices, requiring biocompatible surface coatings, and devices requiring functionalized surface coatings.

MVD® is also used for commercial applications requiring moisture barriers, anti-corrosion coatings, or release layers for imprinting.

The MVD100E is SPTS's designated tool for R&D or pilot manufacturing.

MVD® is finding increasing use in applications requiring moisture barriers, anticorrosion coatings, or release layers for imprinting.

The MVD100E is the designated tool for R&D or pilot manufacturing. 

Features and Benefits

  · Single substrate or small batch processing

  · 200mm wafers

  · Components on trays or racks

  · Small chamber volume for fast processing

  · Top-opening for ease of maintenance and cleaning

  · Cost of Ownership – low consumption and efficient utilization of precursors

  · Integrated plasma surface treatment and chamber clean capability

  · Automated process sequence routines

  · Extensive self-diagnostic and data logging capability

  · Reliability

  · MVD and ALD-capable

Features and Benefits

  · Batch processing for high throughput and small footprint

  · 200mm wafers (Pod loader or EFEM available)

  · 300mm wafers (EFEM enabled)

  · Singulated die on tape frames

  · Components on trays

  · Custom substrate fixturing available

  · Cost of Ownership – low consumption and efficient utilization of precursors

  · Up to 4 Precursors

  · Integrated plasma surface treatment and chamber clean capability

  · Automated process sequence routines

  · Extensive self-diagnostic and data logging capability

  · Reliability

  · MVD and ALD-capable

The MVD4500 is our panel and large substrate tool. It is capable of handling multiple substrates with sizes up to 930 x 720 mm. 

Features and Benefits

  · Batch processing for high throughput and small footprint

  · Gen 4.5 substrates standard – glass, polymer sheets, metals

  · Capable of handling all substrate sizes below as well

  · Components on trays or racks

  · Custom substrate fixturing available

  · Two tools can stack for optimal footprint

  · Switchable GUI/Keyboard for ease of operator use

  · Cost of Ownership – low consumption and efficient utilization of precursors

  · Up to 4 Precursors

  · Integrated plasma surface treatment and chamber clean capability

  · Automated process sequence routines

  · Extensive self-diagnostic and data logging capability

  · Reliability

  · MVD and ALD-capable